Pellicle Frame

A photomask consists of a quartz substrate (transparent plate) with a circuit pattern, a transparent membrane, and a pellicle frame. The pellicle frame attaches the quartz and the membrane from both sides, allowing for smooth pattern exposure during semiconductor processes.

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LCD PELLICLE FRAME

Pattern exposure is achieved through reduced projection using a mask substrate known as a reticle. This critical process lies at the core of semiconductor technology—and at the heart of the reticle is the pellicle frame, an essential component for precision and reliability.

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HISTORY

As a leading manufacturer of semiconductor equipment parts, DONGWON HIGHTECH has consistently contributed to the advancement of the industry through continuous innovation, exceptional quality, and outstanding service since its founding

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CEO
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Since our founding in 1988, DONGWON HIGHTECH has been dedicated to the manufacture of semiconductor equipment components, building a reputation for excellence through continuous technological advancement, superior quality, and trusted service. Our commitment to innovation has been the foundation of our sustained growth and customer satisfaction.

In 2005, we marked a pivotal shift with the launch of our Innovation Management initiative. Through ongoing R&D investments, we successfully developed LCD pellicle frames and secured 13 patents, 3 joint patents, and 1 utility model—demonstrating our drive for technological leadership..

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